Femtosecond Laser Near-Field Process by Nanospheres Beyond Diffraction Limit:Theoretical and Experimental Development
LOU Qianfeng1, LIU Ziyuan1, XUE Lei2, TAO Haiyan1, LIN Jingquan1
1. School of Science, Changchun University of Science and Technology, Changchun 130000, China;
2. AVIC Chengdu CAIC Electronics Co., Ltd., Chengdu 610000, China
During the femtosecond laser processing, how to break through the diffraction limit has always been an important problem. In recent years, nanospheres auxiliary femtosecond laser near field processing with characteristic size beyond the diffraction limit is recognized and developed gradually. It can fabricate nanoholes on the substrate surface of which scale is smaller than the incident laser diffraction limit, and can realize large area processing. In this paper, we will focus on the metal nanospheres and dielectric nanospheres, and introduce the study of nanospheres assisted femtosecond laser near field processing.