Home   |   About Journal   |   Editorial Board   |   Instruction   |   Copy Rights and Ethical Statement   |   Subscriptions   |   Contacts Us   |   Chinese
Aeronautical Manufacturing Technology  2019, Issue (9): 68-73    DOI: 10.16080/j.issn1671–833x.2019.09.068
FORUM Current Issue | Archive | Adv Search |
Uniform Material Removal of Aspherical Surface by Bonnet Polishing
WANG Peng1, YE Sizhe2, ZHANG Hao1, HUI Changshun1
1. Tianjin Jinhang Institute of Technical Physics, Tianjin 300308, China;
2. Xiamen Institute of Rare-Earth Materials, Haixi Institute, Chinese Academy of Sciences, Xiamen 361021, China
Copyright © Editorial Board of Aeronautical Manufacturing Technology
Supported by: Beijing Magtech